lkuna@gitam.edu
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Dr. K Lakshun Naidu is faculty in the Department of Physics, GITAM, Visakhapatnam. He earned his Ph.D. in Physics from the University of Hyderabad, following his M.Sc.- Physics from IIT Roorkee. He gained research experience as a JRF in projects funded by DRDO and DST collaborative work University of Trento,Italy. His research interest includes to study local structure of materials using X-ray absorption spectroscopy and Energy storage materials.
Research Publications
- K. Lakshun Naidu and M. Ghanashyam Krishna, “Effect of thermal annealing on disorder and optical properties of Cr/Si bilayer thin films,” Philos. Mag., vol. 94, no. 30, pp. 3431–3444, 2014.
- M. A. Mohiddon, K. L. Naidu, M. G. Krishna, G. Dalba, S. I. Ahmed, and F. Rocca, “Chromium oxide as a metal diffusion barrier layer: An x-ray absorption fine structure spectroscopy study,” J. Appl. Phys., vol. 115, no. 4, p. 044315, 2014
- V. Shankernath, K. L. Naidu, M. G. Krishna, and K. A. Padmanabhan, “Optical response of ultra-thin titanium nitride films on brass and gold plated brass surfaces,” Mater. Res. Bull.,vol. 85, pp. 121–130,2017.
- A. Tumuluri, K. L. Naidu, and K. J. Raju, “Band gap determination using Tauc’s plot for LiNbO3 thin films,” Int. J. ChemTech Res., vol. 6, no. 6, pp. 3353–3356, 2014.
- K. L. Naidu, M. A. Mohiddon, M. G. Krishna, G. Dalba, and F. Rocca, “Metal induced crystallization of amorphous silicon thin films studied by x-ray absorption fine structure spectroscopy,” J. Phys. Conf. Ser., vol. 430, p. 012035, 2013.
Expertise
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Nanomaterial Synthesis - Thin film deposition techniques-DC/RF/thermal and e-Beam evaporation, Electrospinning and Chemical routes,
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Structural techniques - X-ray Absorption Spectroscopy,X-ray Diffraction , Raman spectroscopy
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Optical and Electron Microscopy,
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Electrochemical Meausurements
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Scientific packages- MATLAB and Origin
